High-resolution, High-purity Calix[n]arene Electron Beam Resist.
نویسندگان
چکیده
منابع مشابه
Polystyrene negative resist for high-resolution electron beam lithography
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0167-9317/$ see front matter 2012 Elsevier B.V. A http://dx.doi.org/10.1016/j.mee.2012.07.005 ⇑ Corresponding author. Tel.: +1 519 729 3582. E-mail addresses: [email protected], j24 (J. Zhang). Previously we demonstrated ultra-dense patterning using 2 kg/mol polystyrene negative electron beam resist that has low sensitivity [16]. To drastically improve its sensitivity, here we studied the expos...
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ژورنال
عنوان ژورنال: Journal of Photopolymer Science and Technology
سال: 2000
ISSN: 0914-9244,1349-6336
DOI: 10.2494/photopolymer.13.413